鈣鈦礦發光二極管自動涂膜機簡單介紹:

狹縫(feng)式涂(tu)布試驗機(ji)由山東安尼麥(mai)特儀器有限公司精心研(yan)制(zhi)高(gao)精度(du)(du)(du)精密型涂(tu)布試驗機(ji)，本機(ji)主要應用(yong)于蓋板(ban)玻璃的(de)各(ge)種涂(tu)膠(jiao)作業而開發設計(ji)的(de)專用(yong)裝置，同時(shi)(shi)也可以用(yong)于其他類似(si)材料的(de)涂(tu)布。本涂(tu)布試驗機(ji)，底板(ban)采用(yong)微(wei)孔陶瓷吸附(fu)平(ping)臺，同時(shi)(shi)采用(yong)非接觸式狹縫(feng)式涂(tu)布頭，通(tong)過進料壓力，狹縫(feng)寬度(du)(du)(du)調節，以及狹縫(feng)頭與底板(ban)間隙三個(ge)因數控制(zhi)濕膜(mo)厚度(du)(du)(du)，同時(shi)(shi)軟件系(xi)統增加了高(gao)度(du)(du)(du)調節與反饋(kui)系(xi)統，大大提高(gao)了涂(tu)布精度(du)(du)(du)與均勻性。

應用場景：針對微米(mi)級特別(bie)是納米(mi)及(ji)亞微米(mi)級功(gong)能(neng)性涂層(ceng)的(de)涂布試(shi)驗、墨(mo)水調試(shi)、工藝研究、小(xiao)規模制(zhi)樣研發等。

涉及行業：包括(kuo)水凝膠(jiao)、液態(tai)金(jin)屬、智(zhi)能(neng)(neng)包裝材(cai)料、光電(dian)(dian)(dian)(dian)(dian)(dian)(dian)材(cai)料、光刻膠(jiao)、功(gong)能(neng)(neng)涂(tu)層(ceng)、微電(dian)(dian)(dian)(dian)(dian)(dian)(dian)子(zi)(zi)及半導體(ti)封裝等(deng)大面積涂(tu)布制備，以及氫燃料電(dian)(dian)(dian)(dian)(dian)(dian)(dian)池(chi)(chi)膜電(dian)(dian)(dian)(dian)(dian)(dian)(dian)極、電(dian)(dian)(dian)(dian)(dian)(dian)(dian)解水制氫膜電(dian)(dian)(dian)(dian)(dian)(dian)(dian)極、鋰電(dian)(dian)(dian)(dian)(dian)(dian)(dian)池(chi)(chi)、各(ge)種(zhong)活性催化劑、異質結(jie)太(tai)陽(yang)(yang)能(neng)(neng)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)池(chi)(chi)、薄膜太(tai)陽(yang)(yang)能(neng)(neng)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)池(chi)(chi)、鈣(gai)(gai)鈦(tai)礦太(tai)陽(yang)(yang)能(neng)(neng)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)池(chi)(chi)、有機(ji)太(tai)陽(yang)(yang)能(neng)(neng)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)池(chi)(chi)、OLED柔(rou)性穿(chuan)戴器(qi)(qi)件、有機(ji)場效應晶體(ti)管,導電(dian)(dian)(dian)(dian)(dian)(dian)(dian)聚合物,納米(mi)(mi)線和納米(mi)(mi)管,二(er)(er)維材(cai)料,有機(ji)發(fa)光二(er)(er)極管和鈣(gai)(gai)鈦(tai)礦發(fa)光二(er)(er)極管、鈣(gai)(gai)鈦(tai)礦光伏電(dian)(dian)(dian)(dian)(dian)(dian)(dian)池(chi)(chi)、鋰離子(zi)(zi)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)池(chi)(chi)的(de)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)解質和電(dian)(dian)(dian)(dian)(dian)(dian)(dian)極、染色敏(min)感性太(tai)陽(yang)(yang)能(neng)(neng)電(dian)(dian)(dian)(dian)(dian)(dian)(dian)池(chi)(chi)、電(dian)(dian)(dian)(dian)(dian)(dian)(dian)子(zi)(zi)皮膚等(deng)器(qi)(qi)件的(de)制備。

  由于常規實驗(yan)(yan)(yan)室涂(tu)布(bu)(bu)試驗(yan)(yan)(yan)機，受到(dao)刮刀調(diao)節(jie)，底板(ban)平整度(du)等的影響很(hen)難達到(dao)涂(tu)布(bu)(bu)納米(mi)級膜，狹縫(feng)式涂(tu)布(bu)(bu)試驗(yan)(yan)(yan)機，底板(ban)采用檢驗(yan)(yan)(yan)級大理(li)石平臺，同(tong)時采用非接觸式狹縫(feng)式涂(tu)布(bu)(bu)頭(tou)，通過進(jin)料壓力，狹縫(feng)寬度(du)調(diao)節(jie)，以及狹縫(feng)頭(tou)與底板(ban)間(jian)隙三個因數(shu)控制濕膜厚度(du)，同(tong)時軟件系(xi)統(tong)增加了(le)高度(du)調(diao)節(jie)與反饋系(xi)統(tong)，大大提高了(le)涂(tu)布(bu)(bu)精度(du)與均(jun)勻性。在(zai)國內(nei)光(guang)學膜涂(tu)布(bu)(bu)實驗(yan)(yan)(yan)室研(yan)發(fa)打樣階(jie)段得到(dao)了(le)廣泛的應用。

鈣鈦礦發光二極管自動涂膜機技術參數 

1. 產品(pin)型號：    AT-XTB-3040A

2.涂布方(fang)式(shi)：狹縫式(shi)涂布頭

3.涂布速度(du)：1-30mm/s  任意設(she)定

4.控制方(fang)式: 觸摸屏

5.涂布濕(shi)膜厚度范圍： 2-100um   （根據(ju)涂布速度和涂布液粘度涂布范圍不(bu)同(tong)

6.干(gan)(gan)膜厚(hou)度范圍(wei)(wei)：  50nm-1000nm  (根據固含量不同干(gan)(gan)膜厚(hou)度范圍(wei)(wei)有偏差）

7.涂布固含量(liang)范圍：1-70%

8.粘度范(fan)圍：1-300CPS

9.均勻性(xing)：4-6%

10.涂布(bu)寬度范圍：10-260mm

11.涂布頭與底(di)板距(ju)離調(diao)節精(jing)度：0.002mm

12.加(jia)熱溫度范圍(wei)：室溫-150度

13.加熱板(ban)功率：2000w

14.涂(tu)布頭(tou)產地(di)：國產 （可以(yi)定制進口涂(tu)布頭(tou)）

15. 氣源壓力(li)：0.6MPa

16. 涂布頭與底板間隙調(diao)節(jie)(jie)方式：手動(dong)調(diao)節(jie)(jie)/自(zi)(zi)動(dong)調(diao)節(jie)(jie)/自(zi)(zi)動(dong)調(diao)節(jie)(jie)帶反饋（調(diao)節(jie)(jie)方式客戶根據自(zi)(zi)己(ji)需要選配）

17. 試樣加持方式：機械固(gu)定(ding)/吸附固(gu)定(ding)（客戶根(gen)據自己(ji)需要選配）

18. 設(she)備總功(gong)率：2500W

19.設備尺寸(cun)：750mmX400mmX450mm

20.涂布平臺尺寸：300X300mm

21.電(dian)源電(dian)壓：220V  50 Hz

產品特點 

1.采(cai)用滾珠絲杠(gang)傳(chuan)動，運行平(ping)穩性更好

2.速度數字化可調，可以根據需要選擇(ze)合適的速度.

3.高精度國產涂布頭，加(jia)料方便，涂布精度高，均(jun)勻性好

4.采用檢驗(yan)級(ji)大理(li)石平(ping)臺，平(ping)整度(du)好(hao)，可以達到(dao)微(wei)米級(ji)別。

5.觸摸(mo)屏控制，自(zi)動化程(cheng)度高，涂布距離可設(she)定，有效保證了涂布試(shi)樣的尺寸。