鈣鈦礦發光二極管涂布試驗機簡單介紹:

狹縫(feng)(feng)式(shi)涂(tu)布(bu)(bu)試(shi)驗(yan)機(ji)由(you)山東安尼麥特儀器有限公司精(jing)心研制(zhi)高(gao)精(jing)度(du)精(jing)密型涂(tu)布(bu)(bu)試(shi)驗(yan)機(ji)，本機(ji)主要應用于蓋(gai)板玻(bo)璃(li)的各種(zhong)涂(tu)膠作業而開(kai)發設(she)計的專用裝置，同時也(ye)可以用于其他(ta)類似材料(liao)(liao)的涂(tu)布(bu)(bu)。本涂(tu)布(bu)(bu)試(shi)驗(yan)機(ji)，底板采用微孔(kong)陶瓷吸附(fu)平臺，同時采用非接觸(chu)式(shi)狹縫(feng)(feng)式(shi)涂(tu)布(bu)(bu)頭(tou)，通過進料(liao)(liao)壓力，狹縫(feng)(feng)寬度(du)調(diao)節，以及狹縫(feng)(feng)頭(tou)與(yu)底板間隙(xi)三個因數控制(zhi)濕膜厚度(du)，同時軟件系統增加了(le)高(gao)度(du)調(diao)節與(yu)反饋(kui)系統，大大提高(gao)了(le)涂(tu)布(bu)(bu)精(jing)度(du)與(yu)均勻性。

應用(yong)場(chang)景：針對微(wei)米級(ji)特別(bie)是納米及(ji)亞微(wei)米級(ji)功(gong)能(neng)性(xing)涂(tu)層的(de)涂(tu)布試(shi)驗、墨水調試(shi)、工藝研究、小規模制樣研發等。

涉及行業(ye)：包(bao)括水凝膠(jiao)、液態金屬、智(zhi)能(neng)(neng)包(bao)裝材料(liao)、光(guang)(guang)電(dian)(dian)(dian)(dian)(dian)材料(liao)、光(guang)(guang)刻膠(jiao)、功能(neng)(neng)涂層、微電(dian)(dian)(dian)(dian)(dian)子及半導體封裝等大面積(ji)涂布制(zhi)備，以及氫燃料(liao)電(dian)(dian)(dian)(dian)(dian)池膜(mo)電(dian)(dian)(dian)(dian)(dian)極、電(dian)(dian)(dian)(dian)(dian)解水制(zhi)氫膜(mo)電(dian)(dian)(dian)(dian)(dian)極、鋰(li)電(dian)(dian)(dian)(dian)(dian)池、各種活性催化(hua)劑、異質結太(tai)(tai)陽能(neng)(neng)電(dian)(dian)(dian)(dian)(dian)池、薄(bo)膜(mo)太(tai)(tai)陽能(neng)(neng)電(dian)(dian)(dian)(dian)(dian)池、鈣(gai)鈦(tai)礦(kuang)太(tai)(tai)陽能(neng)(neng)電(dian)(dian)(dian)(dian)(dian)池、有機(ji)太(tai)(tai)陽能(neng)(neng)電(dian)(dian)(dian)(dian)(dian)池、OLED柔性穿戴器件(jian)、有機(ji)場效應晶(jing)體管(guan),導電(dian)(dian)(dian)(dian)(dian)聚合物,納米線和納米管(guan),二維材料(liao),有機(ji)發光(guang)(guang)二極管(guan)和鈣(gai)鈦(tai)礦(kuang)發光(guang)(guang)二極管(guan)、鈣(gai)鈦(tai)礦(kuang)光(guang)(guang)伏電(dian)(dian)(dian)(dian)(dian)池、鋰(li)離子電(dian)(dian)(dian)(dian)(dian)池的電(dian)(dian)(dian)(dian)(dian)解質和電(dian)(dian)(dian)(dian)(dian)極、染色敏感性太(tai)(tai)陽能(neng)(neng)電(dian)(dian)(dian)(dian)(dian)池、電(dian)(dian)(dian)(dian)(dian)子皮膚等器件(jian)的制(zhi)備。

  由于常(chang)規實驗(yan)室涂布(bu)試驗(yan)機，受到刮刀調節(jie)，底(di)板平整度等的影響很難(nan)達到涂布(bu)納米級(ji)膜(mo)，狹縫(feng)式涂布(bu)試驗(yan)機，底(di)板采(cai)用(yong)檢(jian)驗(yan)級(ji)大理(li)石平臺，同(tong)(tong)時采(cai)用(yong)非接觸(chu)式狹縫(feng)式涂布(bu)頭(tou)，通過進料壓力，狹縫(feng)寬(kuan)度調節(jie)，以及狹縫(feng)頭(tou)與(yu)底(di)板間隙三個因數控制濕(shi)膜(mo)厚度，同(tong)(tong)時軟件系(xi)統增加了(le)(le)高度調節(jie)與(yu)反饋(kui)系(xi)統，大大提高了(le)(le)涂布(bu)精度與(yu)均勻性。在國內(nei)光學(xue)膜(mo)涂布(bu)實驗(yan)室研發打樣階段(duan)得到了(le)(le)廣泛的應用(yong)。

鈣鈦礦發光二極管涂布試驗機技術參數 

1. 產品型號：    AT-XTB-3040A

2.涂布(bu)(bu)方式(shi)：狹縫式(shi)涂布(bu)(bu)頭

3.涂布速度：1-30mm/s  任意(yi)設定

4.控制方式(shi): 觸摸屏

5.涂(tu)(tu)(tu)布濕膜厚度范圍： 2-100um   （根據涂(tu)(tu)(tu)布速度和涂(tu)(tu)(tu)布液(ye)粘(zhan)度涂(tu)(tu)(tu)布范圍不同(tong)

6.干膜厚度(du)范(fan)圍：  50nm-1000nm  (根據固含量不同(tong)干膜厚度(du)范(fan)圍有偏差(cha)）

7.涂(tu)布固含量范(fan)圍：1-70%

8.粘度范圍：1-300CPS

9.均勻性：4-6%

10.涂布寬度范圍：10-260mm

11.涂(tu)布(bu)頭與(yu)底板距離調節精(jing)度：0.002mm

12.加熱溫度范(fan)圍(wei)：室(shi)溫-150度

13.加熱板(ban)功率：2000w

14.涂布(bu)頭(tou)產地(di)：國產 （可以定制(zhi)進口(kou)涂布(bu)頭(tou)）

15. 氣源壓力：0.6MPa

16. 涂布(bu)頭(tou)與底板間隙調(diao)(diao)(diao)節(jie)(jie)方式：手(shou)動調(diao)(diao)(diao)節(jie)(jie)/自動調(diao)(diao)(diao)節(jie)(jie)/自動調(diao)(diao)(diao)節(jie)(jie)帶反饋（調(diao)(diao)(diao)節(jie)(jie)方式客戶根(gen)據自己需要選配）

17. 試(shi)樣加(jia)持方式：機械(xie)固定/吸(xi)附固定（客戶(hu)根據自(zi)己(ji)需要(yao)選配）

18. 設備(bei)總功率：2500W

19.設備尺寸：750mmX400mmX450mm

20.涂布平臺尺寸：300X300mm

21.電(dian)源電(dian)壓：220V  50 Hz

產特特點 

1.采用(yong)滾珠絲杠(gang)傳動，運行平穩性(xing)更(geng)好

2.速(su)度(du)數字化(hua)可調，可以根據需要選(xuan)擇合適的速(su)度(du).

3.高精度國產涂(tu)布頭(tou)，加料方(fang)便，涂(tu)布精度高，均勻性好

4.采用(yong)檢驗級大理(li)石平臺，平整度好(hao)，可以達(da)到(dao)微米級別。

5.觸摸(mo)屏控制，自動化程度高，涂布距離(li)可設(she)定，有效保(bao)證了涂布試樣(yang)的尺寸(cun)。