AT-XTB-3040A 狹縫式涂布試驗機簡單介紹:

狹(xia)縫式(shi)涂布(bu)試(shi)驗(yan)機(ji)由山東安尼麥特儀器有限公司精(jing)(jing)心研制高(gao)(gao)精(jing)(jing)度精(jing)(jing)密型涂布(bu)試(shi)驗(yan)機(ji)，本機(ji)主要應用于蓋(gai)板(ban)(ban)玻(bo)璃(li)的(de)各(ge)種涂膠作(zuo)業而開(kai)發設計的(de)專用裝置(zhi)，同時也(ye)可以用于其他類似材料(liao)的(de)涂布(bu)。本涂布(bu)試(shi)驗(yan)機(ji)，底板(ban)(ban)采用微孔陶瓷吸附(fu)平臺(tai)，同時采用非接觸式(shi)狹(xia)縫式(shi)涂布(bu)頭(tou)，通(tong)過進料(liao)壓力，狹(xia)縫寬度調(diao)節，以及狹(xia)縫頭(tou)與底板(ban)(ban)間(jian)隙三個因數控制濕膜(mo)厚度，同時軟件系(xi)統(tong)增加(jia)了高(gao)(gao)度調(diao)節與反饋系(xi)統(tong)，大大提高(gao)(gao)了涂布(bu)精(jing)(jing)度與均勻性。

應用場景：針(zhen)對微米級特別是納(na)米及亞微米級功能性涂(tu)層的涂(tu)布(bu)試(shi)驗、墨水(shui)調試(shi)、工藝(yi)研究、小(xiao)規模制樣研發等。

涉及(ji)行業：包括水凝膠(jiao)、液(ye)態金屬、智能(neng)(neng)(neng)包裝材料、光(guang)(guang)電(dian)(dian)(dian)(dian)(dian)材料、光(guang)(guang)刻膠(jiao)、功(gong)能(neng)(neng)(neng)涂層、微電(dian)(dian)(dian)(dian)(dian)子及(ji)半導體封裝等大(da)面(mian)積涂布制(zhi)備，以及(ji)氫燃(ran)料電(dian)(dian)(dian)(dian)(dian)池(chi)(chi)膜(mo)電(dian)(dian)(dian)(dian)(dian)極(ji)、電(dian)(dian)(dian)(dian)(dian)解(jie)水制(zhi)氫膜(mo)電(dian)(dian)(dian)(dian)(dian)極(ji)、鋰(li)電(dian)(dian)(dian)(dian)(dian)池(chi)(chi)、各種活性(xing)催化劑、異(yi)質(zhi)結太(tai)(tai)陽(yang)能(neng)(neng)(neng)電(dian)(dian)(dian)(dian)(dian)池(chi)(chi)、薄膜(mo)太(tai)(tai)陽(yang)能(neng)(neng)(neng)電(dian)(dian)(dian)(dian)(dian)池(chi)(chi)、鈣(gai)鈦礦(kuang)太(tai)(tai)陽(yang)能(neng)(neng)(neng)電(dian)(dian)(dian)(dian)(dian)池(chi)(chi)、有(you)(you)機太(tai)(tai)陽(yang)能(neng)(neng)(neng)電(dian)(dian)(dian)(dian)(dian)池(chi)(chi)、OLED柔性(xing)穿戴器(qi)件(jian)、有(you)(you)機場效應晶體管,導電(dian)(dian)(dian)(dian)(dian)聚合物,納米線和(he)納米管,二維材料,有(you)(you)機發(fa)光(guang)(guang)二極(ji)管和(he)鈣(gai)鈦礦(kuang)發(fa)光(guang)(guang)二極(ji)管、鈣(gai)鈦礦(kuang)光(guang)(guang)伏電(dian)(dian)(dian)(dian)(dian)池(chi)(chi)、鋰(li)離子電(dian)(dian)(dian)(dian)(dian)池(chi)(chi)的電(dian)(dian)(dian)(dian)(dian)解(jie)質(zhi)和(he)電(dian)(dian)(dian)(dian)(dian)極(ji)、染色(se)敏感(gan)性(xing)太(tai)(tai)陽(yang)能(neng)(neng)(neng)電(dian)(dian)(dian)(dian)(dian)池(chi)(chi)、電(dian)(dian)(dian)(dian)(dian)子皮膚等器(qi)件(jian)的制(zhi)備。

  由(you)于常規實驗(yan)室(shi)(shi)涂(tu)(tu)布(bu)試(shi)驗(yan)機，受到(dao)刮刀(dao)調節(jie)，底板平(ping)整度等的影響很難(nan)達到(dao)涂(tu)(tu)布(bu)納米級膜，狹(xia)縫式(shi)涂(tu)(tu)布(bu)試(shi)驗(yan)機，底板采(cai)用(yong)檢(jian)驗(yan)級大理石平(ping)臺，同(tong)時(shi)采(cai)用(yong)非接觸式(shi)狹(xia)縫式(shi)涂(tu)(tu)布(bu)頭(tou)(tou)，通過(guo)進料壓(ya)力，狹(xia)縫寬度調節(jie)，以及狹(xia)縫頭(tou)(tou)與底板間隙(xi)三(san)個(ge)因(yin)數控制濕膜厚度，同(tong)時(shi)軟件系統增(zeng)加了(le)高度調節(jie)與反饋系統，大大提高了(le)涂(tu)(tu)布(bu)精度與均(jun)勻性。在國內光學膜涂(tu)(tu)布(bu)實驗(yan)室(shi)(shi)研發打樣階段得到(dao)了(le)廣泛的應用(yong)。

AT-XTB-3040A 狹縫式涂布試驗機技術參數 

1. 產品型(xing)號：  ;  AT-XTB-3040A

2.涂布(bu)方式(shi)：狹縫(feng)式(shi)涂布(bu)頭(tou)

3.涂布速度：1-30mm/s  任意設定

4.控制方式: 觸摸屏

5.涂(tu)布濕膜厚(hou)度范(fan)(fan)圍： 2-100um   （根據涂(tu)布速度和涂(tu)布液粘度涂(tu)布范(fan)(fan)圍不同

6.干(gan)膜(mo)厚度范(fan)圍：  50nm-1000nm  (根據固含量(liang)不同干(gan)膜(mo)厚度范(fan)圍有偏差）

7.涂布固含量(liang)范圍：1-70%

8.粘度范(fan)圍：1-300CPS

9.均勻性：4-6%

10.涂布(bu)寬度范圍(wei)：10-260mm

11.涂(tu)布頭(tou)與(yu)底板距離(li)調(diao)節精度：0.002mm

12.加熱溫度范圍：室溫-150度

13.加熱板功(gong)率：2000w

14.涂布頭產(chan)地(di)：國產(chan) （可(ke)以定(ding)制進口涂布頭）

15. 氣源(yuan)壓力(li)：0.6MPa

16. 涂布頭與(yu)底板間隙調節(jie)方(fang)式：手動調節(jie)/自動調節(jie)/自動調節(jie)帶反饋（調節(jie)方(fang)式客戶根據自己需(xu)要選配(pei)）

17. ;試樣(yang)加持方(fang)式：機械(xie)固定/吸附(fu)固定（客戶根(gen)據自己需要(yao)選(xuan)配）

18. 設備總功率(lv)：2500W

19.設備尺寸：750mmX400mmX450mm

20.涂布平臺尺寸：300X300mm

21.電源電壓(ya)：220V  50 Hz

產品(pin)特點 

1.采用滾(gun)珠(zhu)絲杠傳(chuan)動，運行(xing)平穩性更好

2.速(su)度數字化可(ke)調，可(ke)以根據需要選擇合適的(de)速(su)度.

3.高精度(du)國產(chan)涂布頭，加料(liao)方便(bian)，涂布精度(du)高，均勻(yun)性好(hao)

4.采用檢(jian)驗級(ji)大理石平臺，平整度(du)好，可以達到(dao)微米(mi)級(ji)別(bie)。

5.觸(chu)摸屏控制，自動(dong)化(hua)程度高，涂布距離(li)可(ke)設定，有效保證(zheng)了涂布試樣的尺寸。