AT-XTB-1050A工藝研究自動涂膜機簡單介紹：

狹(xia)縫(feng)(feng)式(shi)涂(tu)布(bu)(bu)試(shi)(shi)驗機(ji)由山東安尼麥特儀器有限公司精心(xin)研制(zhi)高精度精密(mi)型涂(tu)布(bu)(bu)試(shi)(shi)驗機(ji)，本機(ji)主要應用于蓋板(ban)玻(bo)璃的(de)各種(zhong)涂(tu)膠作業而(er)開(kai)發設(she)計的(de)專(zhuan)用裝置，同(tong)時(shi)也可以用于其他(ta)類(lei)似材料的(de)涂(tu)布(bu)(bu)。本涂(tu)布(bu)(bu)試(shi)(shi)驗機(ji)，底板(ban)采用微孔陶瓷(ci)吸附平臺，同(tong)時(shi)采用非接觸式(shi)狹(xia)縫(feng)(feng)式(shi)涂(tu)布(bu)(bu)頭，通過進料壓力，狹(xia)縫(feng)(feng)寬(kuan)度調(diao)節，以及狹(xia)縫(feng)(feng)頭與(yu)底板(ban)間隙三(san)個(ge)因(yin)數控制(zhi)濕膜厚度，同(tong)時(shi)軟件系(xi)統增加了高度調(diao)節與(yu)反(fan)饋系(xi)統，大大提高了涂(tu)布(bu)(bu)精度與(yu)均勻性。

應用場景：針對(dui)微(wei)米級特別是納米及亞微(wei)米級功能性涂層的涂布試驗、墨(mo)水調試、工藝研(yan)究、小規(gui)模制樣研(yan)發等(deng)。

涉及(ji)行業(ye)：包(bao)括(kuo)水凝膠、液態金屬、智能(neng)(neng)包(bao)裝材料(liao)(liao)、光(guang)(guang)電(dian)(dian)(dian)(dian)材料(liao)(liao)、光(guang)(guang)刻膠、功(gong)能(neng)(neng)涂層(ceng)、微電(dian)(dian)(dian)(dian)子(zi)及(ji)半(ban)導(dao)體(ti)封裝等大面積(ji)涂布(bu)制(zhi)備(bei)(bei)，以及(ji)氫燃料(liao)(liao)電(dian)(dian)(dian)(dian)池(chi)(chi)膜電(dian)(dian)(dian)(dian)極(ji)(ji)、電(dian)(dian)(dian)(dian)解(jie)水制(zhi)氫膜電(dian)(dian)(dian)(dian)極(ji)(ji)、鋰(li)(li)電(dian)(dian)(dian)(dian)池(chi)(chi)、各種活性(xing)催化劑、異質結(jie)太(tai)(tai)陽(yang)(yang)能(neng)(neng)電(dian)(dian)(dian)(dian)池(chi)(chi)、薄膜太(tai)(tai)陽(yang)(yang)能(neng)(neng)電(dian)(dian)(dian)(dian)池(chi)(chi)、鈣鈦礦(kuang)太(tai)(tai)陽(yang)(yang)能(neng)(neng)電(dian)(dian)(dian)(dian)池(chi)(chi)、有機太(tai)(tai)陽(yang)(yang)能(neng)(neng)電(dian)(dian)(dian)(dian)池(chi)(chi)、OLED柔性(xing)穿戴器件、有機場效應晶體(ti)管(guan),導(dao)電(dian)(dian)(dian)(dian)聚合物,納米(mi)線和(he)納米(mi)管(guan),二(er)維材料(liao)(liao),有機發光(guang)(guang)二(er)極(ji)(ji)管(guan)和(he)鈣鈦礦(kuang)發光(guang)(guang)二(er)極(ji)(ji)管(guan)、鈣鈦礦(kuang)光(guang)(guang)伏電(dian)(dian)(dian)(dian)池(chi)(chi)、鋰(li)(li)離子(zi)電(dian)(dian)(dian)(dian)池(chi)(chi)的電(dian)(dian)(dian)(dian)解(jie)質和(he)電(dian)(dian)(dian)(dian)極(ji)(ji)、染色敏感性(xing)太(tai)(tai)陽(yang)(yang)能(neng)(neng)電(dian)(dian)(dian)(dian)池(chi)(chi)、電(dian)(dian)(dian)(dian)子(zi)皮膚等器件的制(zhi)備(bei)(bei)。

由(you)于常規實驗室(shi)涂(tu)布(bu)試驗機(ji)，受到刮刀調(diao)節(jie)，底(di)板平(ping)整度(du)等的(de)影響很難達到涂(tu)布(bu)納(na)米級膜，狹(xia)縫(feng)式(shi)涂(tu)布(bu)試驗機(ji)，底(di)板采用檢驗級大(da)理石平(ping)臺，同(tong)(tong)時采用非(fei)接觸式(shi)狹(xia)縫(feng)式(shi)涂(tu)布(bu)頭，通過進料壓力(li)，狹(xia)縫(feng)寬(kuan)度(du)調(diao)節(jie)，以及狹(xia)縫(feng)頭與(yu)底(di)板間隙三個因數控制濕膜厚度(du)，同(tong)(tong)時軟件系統增(zeng)加了(le)高(gao)(gao)度(du)調(diao)節(jie)與(yu)反饋系統，大(da)大(da)提高(gao)(gao)了(le)涂(tu)布(bu)精(jing)度(du)與(yu)均勻性。在國內光(guang)學膜涂(tu)布(bu)實驗室(shi)研發(fa)打樣階段得到了(le)廣泛的(de)應用。

AT-XTB-1050A工藝研究自動涂膜機技術參數 

1.狹縫擠(ji)出頭材質：不銹鋼

2.狹縫擠出頭涂布寬(kuan)度：10-50mm

3.狹縫擠出墊片厚度:100 μm

3.狹(xia)縫擠出墊片套裝:5 個 50毫(hao)米(mi)(mi)寬墊片或5 個 25毫(hao)米(mi)(mi)寬的墊片

4.電熱板(ban)溫(wen)度:120°C

5.行程長度:10-100mm

6.平臺速度:100 μm.s-1

7.最高平臺(tai)速(su)度(du):50 mm s - 1

8.注射器(qi)速度:12 μm.s-1

9.最高(gao)注射速度:5 mm.s-1

10.涂布(bu)頭(tou)與基(ji)片之(zhi)間最大活動(dong)距(ju)離:13 mm

11.管道和接(jie)頭材質:聚四氟乙烯管，高密度PP魯爾(er)(er)接(jie)口鎖(suo)定連接(jie)器(qi)(qi)、不(bu)銹(xiu)鋼魯爾(er)(er)接(jie)口連接(jie)器(qi)(qi)至螺(luo)紋連接(jie)件

12.電源(yuan)參數：100 - 240 V 50Hz

13.尺(chi)寸規格:380 mm x 330 mm x 220 mm

14.重(zhong)量：30kg